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Sensors and Control Systems for Advanced Process Control (APC) in Atomic Layer Deposition (ALD)

Principal Investigator(s): 


This work is aimed at improving the process performance and controllability of atomic layer deposition processes, using real-time sensor techniques and a custom cross-flow ALD system equipped with a portfolio of MKS components, sensor and control system. It supports a wide variety of applications in semiconductor and nanotechnology, as well as fundamental research in combinatorial ALD for understanding and optimizing ALD processes.